Post Develope Rinse Heater :

Heater:

Patent pending design utilizing infrared radiation heating technique. All wetted materials of Teflon PFA ?. No coated metals in contact with process fluids. This technique converts ~75% of the energy into liquid heat. Rapid heat up and cool down is not plagued by convection delays present in other systems.

Single Pass Flexibility:

Single Pass Heating. Provides an output temperature control of +/- 1 C when using a constant input flow and temperature.?For post develop rinse a?wafer to wafer profile signature can be duplicated within +/- 0.1 C by utilizing a predispense function. Variable Flow Closed Loop Single Pass Heating is also available. Heating energy is controlled via an algorithm based on input flow and temperature. Output temperature is controlled to +/- 1 C independent of input variables within a specified range.

Recirculation Heating:

Reservoir heating can be achieved by using this product in the recirculation loop. Heat up time and final temperature are dependent on temperature delta and flow rate.

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